兆声波清洗系统

White Knight offers Imtec Accumeg™ and PCT HyperClean™ systems. PCT and Imtec are leaders in advanced megasonic cleaning technology, offering high-frequency, non-damaging cleaning solutions for semiconductors, optics, medical implants, and industrial parts. Both solutions are ideal for high-purity, precision cleaning applications.

Imtec’s Accumeg™ 兆声波清洗系统 efficiently deliver continuous megasonic energy across the entire process tank to ensure fast, uniform cleaning and prevent particle reattachment. Unlike pulsed systems, its full-coverage transducer array avoids energy loss from shadowing or sequencing. Accumeg combines proven reliability with low maintenance.

PCT’s HyperClean™ 兆声波清洗系统 features moving-beam and phase-shifting technology, achieving over 90% acoustic energy efficiency, housed in compact, high-purity quartz vessels. The systems incorporate PCT’s unique generators and transducers for reliable submicron cleaning at elevated temperatures, while reducing chemical use and cleanroom footprint.

These systems sets the industry standard in high-purity, high-power megasonic cleaning and offer reliable, innovative solutions for a wide range of applications, including semiconductors, optics, MEMS, LEDs, solar cells, and flat panels.

兆声波清洗系统产品信息

Megasonic Cleaning Technology

How Megasonic Cleaning Works:

Megasonic cleaning uses high-frequency sound waves—typically in the megahertz range—generated by a piezoelectric transducer to create microscopic cavitation bubbles in a fluid. These small, energetic bubbles form and collapse rapidly, producing gentle yet powerful cleaning action that dislodges submicron particles from delicate surfaces without causing damage. Unlike lower-frequency ultrasonic cleaning, which produces larger, potentially harmful bubbles, megasonic bubbles penetrate tight spaces, crevices, and complex geometries—making this method ideal for cleaning sensitive components like silicon wafers, semiconductors, and medical devices.

Benefits of Megasonic Cleaning:

• No moving parts for improved cleanliness
• Improved energy uniformity—no dead spots
• More than 90% acoustical-energy efficiency
• Uniform particle removal
• High-energy density with low-power output for extended transducer life
• High-purity heated quartz vessel for the highest-purity processing
• Easy to retrofit to existing wet stations
• Available for wafers up to 450 mm and beyond
• Optional filtered/recirculation version
• Acid / solvent / stripper-compatible materials available
• Available in manual and automatic stand-alone systems
• Frequency range 450 KHz – 1 MHz

Megasonic vs. Ultrasonic Cleaning:

As semiconductor devices become smaller and more delicate, ultrasonic cleaning—typically under 100 kHz—is increasingly unsuitable due to its high cavitation energy, which can damage sensitive structures. In contrast, megasonic cleaning uses higher frequencies (600–2000 kHz) that generate smaller, gentler cavitation bubbles. This allows for effective particle removal without harming fragile substrates. Factors like fluid surface tension and distance from the transducer can influence cleaning performance, but frequency remains the key differentiator—making megasonic cleaning the preferred choice for advanced semiconductor applications.

Megasonic Cleaning Applications

Megasonic cleaning is utilized for several applications:

Disk Drive components

When large amounts of media need to be cleaned quickly, the unsurpassed power and intensity of megasonic processing removes even stubborn particles with quick efficiency. When small and discrete three-dimensional parts require the removal of the smallest particles, megasonic processing sends energy through and across parts and substrates to clean in those hidden recesses.

Electrochemical processing

Whether plating, polishing/etching or grid-xing surface layers, concentration polarization and fluid stagnation in trenches and vias can lead to slow diffusion limited processing. Megasonic processing allows sonic energy to transfer through substrates and across features to maximize bulk fluid movement even in small trenches and recesses to minimize diffusion limiting stagnant locations.

Flat and flex panel

When ample areas require sonic energy,  megasonic processing with wide area megasonic nozzle technology provides the processing fluid directly to the substrate surface simultaneously with the sonic energy to uniformly process large areas efficiently.

LED

PCT Systems, Inc.  offers sonic assisted and non-sonic tanks for use in LED manufacturing. High temperature quartz constant temperature baths, and megasonic assisted tanks for post scribe clean applications.

MEMS

Developing resist and wet etching substrates can be a problem because of the discrete features and tortuous paths that the processing liquid must follow. Fluid stagnation producing dead areas can lead to locally slow diffusion limited mass transfer. Megasonic processing can allow sonic energy to transfer through substrates and across discrete devices eliminating stagnant areas and increasing mass transfer rates.

Nanoscale Particle 

Cleaning of sub 50 nanometer particles is becoming a real challenge. With megasonics processing technologies multiple frequencies up to 2 MHz can be utilized simultaneously to provide special processing modes to clean even the smallest particles on the most delicate features.

Optics

Sensitive optics can be damaged by low frequency. Ultrasonic tanks have the potential to cause crazing and cracking. PCT Systems, Inc. offers a wide range of high frequency Megasonic tanks for cleaning optics after various lapping and polishing processes.

Resist Stripping

When it is time for stripping resists, megasonic processing can be combined with dissolved ozone or other chemicals in various liquids to produce the highest gas transfer rates available. Megasonic processing can disrupt thin liquid boundary layers to enhance mass transfer of various gases and liquids needed for enhanced processing.

Solar Cell Fabrication

When rapid particle removal, increased etch rates and substrate cleaning is required on large scale substrates, megasonic processors can assist in new manufacturing technologies.

Megasonic Services

For over 20 years, PCT Systems, Inc. has pioneered and developed leading cleaning semiconductor manufacturing industries with products ranging from megasonic generators and transducer plates, quartz, stainless steel and plastic process tanks. With numerous patents customers around the world have come to depend on us for the highest quality and performance whether using a standard product or a custom engineered solution. With the development of specific geometries and more fragile structures and wafers, customers need more process development options than ever before to be successful, productive and profitable.

PCT Systems, Inc. has always positioned itself as nimble, responsive, innovative, and ready to handle new challenges brought to our attention. If you don’t see what you’re looking for on our website that doesn’t mean we can’t accomodate your needs.