Megasonic Quick Dump Rinser
PCT’s Megasonic cleaning is the most advanced solution for achieving HyperClean™ semiconductor wafers available today. It has become the new standard for megasonic cleaning and rinsing tanks.
PCT Systems Megasonic Quick Dump Rinser construction exceeds the most stringent demands of today’s wafer fabrication processes. Demanding submicron cleaning processes are further supported by Megasonic rinsing, residual chemicals and particles are quickly removed by megasonic pressure waves and acoustic streaming forces.
The Megasonic Quick Dump Rinser from PCT is available in a variety of vessel materials, and has four-side overflow. It is designed for low water volume, while providing the ultimate in megasonic cleaning.
