HyperClean™ Megasonic Cleaning Systems
HyperClean™ systems set the industry standard for megasonic cleaning technology. They are designed for advanced submicron cleaning in semiconductor, MEMS, optics, LED, storage media, and solar applications. Operating at over 90% acoustic energy efficiency, HyperClean™ uses a unique combination of moving-beam and phase-shifting technology to deliver uniform, high-density energy across wafers. Its all-quartz, heated vessel ensures high purity, elevated temperature operation, and reduced chemical use. A multiplexed, fixed transducer array eliminates dead zones, enhances cleaning efficiency, and extends transducer life—without the need for cooling. Easily retrofittable into existing wet stations and compatible with multiple interface protocols, HyperClean™ offers unmatched reliability, lower operating costs, and seamless integration.
